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  • Step coverage of thin titania films on patterned silicon substrate by pulsed-pressure MOCVD

    Authors
    Susan Krumdieck, V. Siriwongrungson, M.M. Alkaisi
    Journal
    Surface and Coatings Technology
    Year
    2007
    Thin titania (TiO2) films were deposited on patterned silicon (Si), and silicon nitride (SiN) substrates by pulsed-pressure metal organic chemical vapor deposition (PP-MOCVD) using titanium tetra-isop... REGISTER NOW TO SEE MORE

  • In situ infrared spectroscopic analysis of the adsorption of ruthenium(II) bipyridyl dicarboxylic acid photosensitisers to TiO2 in aqueous solutions

    Authors
    Keith Gordon, B.H. Robinson, A.J. McQuillan, N.W. Duffy, K.D. Dobson
    Journal
    Chemical Physics Letters
    Year
    1997
    Internal reflection spectroscopy has been used to obtain the in situ infrared spectra of ruthenium(II) bipyridyl dicarboxylic acid photosensitiser species adsorbed to Degussa P25 and sol-gel TiO2 film... REGISTER NOW TO SEE MORE