- coating
- composition
- coverage
- deposition
- eds
- electron
- evaluated
- evenness
- examined
- exhibiting
- features
- grain
- metal
- micron_scale
- microscope
- morphology
- nitride
- nm
- organic
- pa
- patterned
- peak
- phases
- pp_mocvd
- precursor
- pressure
- principal
- pulsed_pressure
- qualitatively
- scanning
- si
- silicon
- sin
- slight
- spectroscopy
- statistical
- step
- substrate
- tetra_isopropoxide
- thicknesses
- titania
- titanium
- ttip
- vapour
- varied
- X_ray
Connecting New Zealand's energy researchers to shape the future
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Publications
Publications
-
- Authors
- Susan Krumdieck, V. Siriwongrungson, M.M. Alkaisi
- Journal
- Surface and Coatings Technology
- Year
- 2007
- Thin titania (TiO2) films were deposited on patterned silicon (Si), and silicon nitride (SiN) substrates by pulsed-pressure metal organic chemical vapor deposition (PP-MOCVD) using titanium tetra-isop... REGISTER NOW TO SEE MORE
Step coverage of thin titania films on patterned silicon substrate by pulsed-pressure MOCVD