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  • Step coverage of thin titania films on patterned silicon substrate by pulsed-pressure MOCVD

    Authors
    Susan Krumdieck, V. Siriwongrungson, M.M. Alkaisi
    Journal
    Surface and Coatings Technology
    Year
    2007
    Thin titania (TiO2) films were deposited on patterned silicon (Si), and silicon nitride (SiN) substrates by pulsed-pressure metal organic chemical vapor deposition (PP-MOCVD) using titanium tetra-isop... REGISTER NOW TO SEE MORE